UVLED R2R NIL
Nano Imprint Lithography (NIL) provides a cost‐effective route to high resolution patterning beyond the resolution limits of optical lithography. In particular, Roll‐to‐Roll Nanoimprinting (R2RNIL) represents a new manufacturing technology in Nanofabrication that enables the production of high value‐added technology products on flexible substrates economically and at high throughput. Myriad commercial products and applications are slated to be impacted by this approach, including displays, lighting, energy storage, electronics and solar photovoltaics, among many others. These high‐value consumer electronics applications are predicted to see double‐digit market growth beyond the next decade (IDTechEx 2009‐2029 Market Report).
Collaborating with IMRE (Institute of Material Research and Engineering), SOLVE has developed an industrial grade R2R NIL system. This project was funded by ETPL (Exploit Technologies Pte Ltd). Our production system is the culmination of 3 years, multiple iterations and continuous improvements. Currently this system can achieve up to 20
meters per minute continuous throughput at feature resolutions down to 40 nm diameter.